Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session)

DS 44.59: Poster

Freitag, 30. März 2012, 09:30–12:00, Poster E

Investigation of Linear Dichroism in ALD layers of TiO₂ — •Chittaranjan Das, Matthias Städter, Massimo Tallarida, and Dieter Schmeisser — Brandenburgische Technische Universität, Konrad Wachsmann Allee, 17, 03046, Cottbus, Germany

Titanium dioxide is on the most studied material due to its wide range of applications in various fields such as self cleaning, photocatalysis, solar cell, water splitting, bio-implants, etc. In order to increase its efficiency in water splitting and solar cell, it is necessary to understand the crystal structure and electronic properties in thin films. In our approach we are investigating the X-ray linear dichroism (XLD) of thin layers of TiO₂. XLD studies have been done in multiferroics, antiferromagnetic, and ferromagnetic materials, but a very less amount of work have been done in studying XLD effect of TiO₂ thin films. These layers are grown by in-situ atomic layer deposition (ALD) system and are investigated with X-ray absorption spectroscopy (XAS) at BESSY II, Berlin. ALD is a promising technique to grow thin films on different substrates conveniently due to its uniform deposition property. XAS study will also help us to better understand the interfacial electronic properties of thin films of TiO₂.