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Mo, 09:30–12:15 |
H 0111 |
DS 1: Layer properties: electrical, optical, and mechanical properties |
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Mo, 12:30–13:30 |
H 0111 |
DS 2: Nanoengineered thin films |
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Mo, 15:00–17:00 |
H 0111 |
DS 3: Focused electron beam induced processing for the fabrication of nanostructures I (focused session, jointly with O – Organizers: Huth, Marbach) |
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Mo, 09:30–10:00 |
H 2032 |
DS 4: Thin film photovoltaics |
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Mo, 10:00–11:00 |
H 2032 |
DS 5: Thin film photovoltaics: CIGSe + CdTe |
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Mo, 11:15–12:45 |
H 2032 |
DS 6: Thin film photovoltaics: CIGSe + processing |
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Mo, 15:00–16:15 |
H 2032 |
DS 7: Organic electronics and photovoltaics I (jointly with CPP, HL, O) |
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Mo, 16:30–18:00 |
H 2032 |
DS 8: Thin film photovoltaics: oxides and nanostructures |
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Mo, 09:30–12:45 |
EB 301 |
DS 9: Multiferroics I: Junctions and thin films / Magnetoelectric coupling (jointly with MA, DF, KR, TT) |
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Mo, 15:00–18:30 |
EB 301 |
DS 10: Multiferroics II: Hexagonal manganites / Incommensurate multiferroics (jointly with MA, DF, KR, TT) |
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Mo, 16:45–18:00 |
H 3005 |
DS 11: Multiferroics: Matter at low temperature (jointly with MA, DF, TT, KR) |
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Mo, 15:00–17:45 |
EB 202 |
DS 12: FePt Nanoparticles (jointly with MA, MM – Organizer: Farle) |
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Di, 09:30–11:30 |
H 0111 |
DS 13: Focused electron beam induced processing for the fabrication of nanostructures II (focused session, jointly with O – Organizers: Huth, Marbach) |
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Di, 11:45–12:45 |
H 0111 |
DS 14: Ion irradiation effects |
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Di, 09:30–11:15 |
H 2032 |
DS 15: Organic electronics and photovoltaics: simulations and optics I (jointly with CPP, HL, O) |
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Di, 11:30–13:00 |
H 2032 |
DS 16: Organic electronics and photovoltaics: simulations and optics II (jointly with CPP, HL, O) |
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Di, 09:30–12:45 |
EB 301 |
DS 17: Multiferroics III: Strain / New routes towards multiferroicity (jointly with MA, DF, KR, TT) |
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Di, 13:30–14:00 |
HE 101 |
DS 18: Gaede Prize talk (Mato Knez) |
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Di, 12:15–15:15 |
Poster A |
DS 19: Poster I: Multiferroics (jointly with MA, DF, KR, TT), Spins in organic materials (jointly with MA), FePt Nanoparticles (jointly with MA, MM) |
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Mi, 09:30–11:30 |
H 0111 |
DS 20: Application of thin films |
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Mi, 11:45–13:45 |
H 0111 |
DS 21: Micro- and nanopatterning (jointly with O) |
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Mi, 15:00–17:15 |
H 0111 |
DS 22: Trends in atomic layer deposition I (Focused session – Organizer: Nielsch) |
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Mi, 17:30–19:45 |
H 0111 |
DS 23: Trends in atomic layer deposition II (Focused session – Organizer: Nielsch) |
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Mi, 09:30–11:15 |
H 2032 |
DS 24: Organic electronics and photovoltaics: electronic properties I (jointly with CPP, HL, O) |
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Mi, 11:30–13:00 |
H 2032 |
DS 25: Organic electronics and photovoltaics: electronic properties II (jointly with CPP, HL, O) |
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Mi, 15:00–16:30 |
H 2032 |
DS 26: Thin film characterization: structure analysis and composition (Ion assisted methods and analysis) |
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Mi, 16:30–17:30 |
H 2032 |
DS 27: Thin film characterization: structure analysis and composition (post growth analysis XRD, etc..) |
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Mi, 17:45–19:45 |
H 2032 |
DS 28: Thin film characterization: structure analysis and composition (Spectroscopy) |
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Mi, 09:30–11:30 |
EB 407 |
DS 29: High-k and low-k dielectrics (joint session with DF) |
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Do, 09:30–11:00 |
H 0111 |
DS 30: Thin film characterization: structure analysis and composition (TEM, LEED, PAS) |
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Do, 11:15–13:00 |
H 0111 |
DS 31: Organic thin films I |
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Do, 09:30–11:00 |
H 2032 |
DS 32: Thermoelectric materials I (Focused session – Organizers: Meyer, Heiliger) |
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Do, 11:15–12:45 |
H 2032 |
DS 33: Thermoelectric materials II: Reduced dimensionality (Focused session – Organizers: Meyer, Heiliger) |
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Do, 15:00–17:30 |
H 2032 |
DS 34: Organic thin films II: Interface spectroscopy |
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Do, 17:45–19:30 |
H 2032 |
DS 35: Organic thin films III: Monolayers and crystals |
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Do, 16:45–19:00 |
H 1012 |
DS 36: Spins in Organic Materials (jointly with MA) |
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Do, 15:00–17:00 |
Poster E |
DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films |
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Do, 17:30–19:00 |
Poster E |
DS 38: Poster III: Resistive switching (jointly with DF, KR, HL); Thermoelectric materials (Focused session); Micro- and nanopatterning (jointly with O); Ion irradiation effects |
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Fr, 09:30–10:45 |
H 0111 |
DS 39: Resistive switching I (jointly with DF, KR, HL) |
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Fr, 11:00–12:30 |
H 0111 |
DS 40: Resistive switching II (jointly with DF, KR, HL) |
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Fr, 09:30–11:15 |
H 2032 |
DS 41: Thermoelectric materials III: Heterostructures (Focused session – Organizers: Meyer, Heiliger) |
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Fr, 11:30–13:00 |
H 2032 |
DS 42: Thermoelectric materials IV: Glass, sintered materials (Focused session – Organizers: Meyer, Heiliger) |
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Fr, 13:30–16:00 |
H 2032 |
DS 43: Thermoelectric materials V: Bulk materials (Focused session – Organizers: Meyer, Heiliger) |
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Fr, 09:30–12:00 |
Poster E |
DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session) |
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