Berlin 2012 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 71: Poster Session: Graphene / Topological Insulators / Interfaces and Surfaces

HL 71.1: Poster

Mittwoch, 28. März 2012, 16:00–19:00, Poster D

Nanomachining of mono- and bilayer graphene with the atomic force microscope — •Johannes Rode, Hennrik Schmidt, Dmitri Smirnov, and Rolf J. Haug — Institut für Festkörperphysik, Leibniz Universität Hannover, D-30167 Hannover, Germany

We investigate the effects of mechanical manipulation on mono- and bilayer graphene via atomic force microscope (AFM). Graphene flakes are obtained by micromechanical cleavage of natural graphite and are placed on a silicon substrate with a top layer of silicon dioxide. Mono- and bilayers are spotted and identified, using the optical microscope. Detailed height profiles can then be obtained by AFM, which also serves as a tool to mechanically manipulate the graphene by controlled tip movements at higher contact forces. This manipulation is performed in two ways: The effects of scratching lines into graphene with a diamond coated AFM-tip are investigated for different parameters. Furthermore we show AFM-induced folding of mono- and bilayer graphene on a µm-scale. These twisted bilayers (in case of folded monolayers) form decoupled systems which hold interesting electronic properties like a screening effect and reduced Fermi velocities.