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MA: Fachverband Magnetismus

MA 52: Poster II - Magnetic Heusler compounds, Magnetic shape memory alloys, Thin Films, Micro-/Nano-structured magnetic materials, Graphene, Spins in organics, Magnetic imaging, Surface Magnetism, Spin excitations/Torque, Spincaloric transport

MA 52.33: Poster

Freitag, 30. März 2012, 11:00–14:00, Poster A

Ion beam irradiation of interlayer exchange coupled trilayers in the sub-micron regime — •Roland Neb¹, Thomas Sebastian¹, Philipp Pirro¹, Stefan Pofahl², Rudolf Schäfer², Bernhard Reuscher³, and Burkard Hillebrands¹ — ¹TU Kaiserslautern, Landesforschungszentrum Optimas, 67663 Kaiserslautern, Germany — ²IFW Dresden, 01069 Dresden, Germany — ³IFOS Kaiserslautern, 67663 Kaiserslautern, Germany

Focused ion beam irradiation is a well known tool for patterning thin film media. We use this tool to pattern an antiferromagnetically coupled Fe/Cr/Fe trilayer in the micron and sub-micron regime. The irradiated areas become ferromagnetic, allowing for the creation of well-defined ferromagnetic areas in an antiferromagnetically coupled environment. The suitability of such irradiated elements for information storage was investigated. We found that if certain conditions for the patterning process are met, sub-micron elements are able not only to store information but also to be overwritten by a sufficiently high magnetic field. The resulting bit density is strongly dependent on the applied ion dose, changing by a factor of 100 in the regime of 10¹⁴ to 10¹⁶ ions/cm².

Financial support by the Deutsche Forschungsgemeinschaft, the Graduate School Material Science in Mainz and the Graduiertenkolleg 792 is gratefully acknowledged.