Berlin 2012 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 3: Scanning probe microscopy

MI 3.2: Vortrag

Montag, 26. März 2012, 13:00–13:15, EMH 225

New generation micro vacuum gauge for ultra high vacuum measurements using modified AFM tips — •Amra Avdic, Anna-Maria Lausch, Alois Lugstein, and Emmerich Bertagnolli — Solid State Electronics Institute, Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria.

Every modern high vacuum and ultrahigh vacuum system relies on ionization gauges for pressure measurements under 10E-3 Torr. For the first time we present the micro vacuum gauge (MVG) fabricated by modification of commercial available metall-coated Si Atomic Force Microscopy (AFM) tips with the lateral resolution < 1um. As any cold-cathode based vacuum gauge, our MVG consist of two properly insulated electrodes integrated on the AFM tip, forming coaxial embodiment. The conductive AFM probes are insulated with a Si3N4 layer using plasma enhanced chemical vapour deposition and subsequently coated by a second metallic layer, which later forms a ring shaped collector around the tip. Our self aligned approach for MVG formation comprises focused ion beam (FIB) machining and isotropic Reactive Ion Etching (RIE). The RIE is used to selectively etch the insulation and expose the conductive tip, thereby forming the cavity between the immediate tip (emitter) of about 60 nm in diameter and the ring (collector) separated by a cavity of about 600nm. After the modification the MVG is mounted into the Crossbeam Neon40EsB and tested upon the gas injection available at this system.