Berlin 2012 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 8: Poster – Microanalysis and microscopy

MI 8.1: Poster

Mittwoch, 28. März 2012, 15:00–17:30, Poster E

XRF-instrumentation for polarization-dependent and reference-free nano-analysis as well as design study for 450 mm wafer-analysis — Jan Weser, Janin Lubeck, and •Ina Holfelder — Physikalisch-Technische Bundesanstalt, Abbestr. 2-12, 10587 Berlin

New instrumentation for polarization-dependent measurements became recently available at PTB and will be presented. The new analytical chamber allows for polarization-dependent fluorescence measurements on e.g. functional nano-layers. The maximum sample size is 4 inch in diameter. By means of two orthogonally arranged Silicon Drift Detectors, the measurements can be realized spatially resolved and depths sensitive with a large angular range. This new instrumentation increases the measurement options for the plane-grating and four-crystal monochromator beamlines of the PTB at BESSYII, and makes it possible to measure layer thickness and composition, depth-dependent element profiles, and bonding states. Furthermore, in the framework of European project EEMI450, an advanced metrology chamber for 450 mm wafer is being designed. The current instrumentation of the PTB should be transferred for the 450 mm wafer application and completed with optical analytical methods. The current status of this virtual design studies will be presented too.