Berlin 2012 – scientific programme

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MM: Fachverband Metall- und Materialphysik

MM 17: Poster Session

MM 17.44: Poster

Monday, March 26, 2012, 17:00–19:00, Poster B

Hydrogen absorption behavior of nano-crystalline Mg thin films — •Helmut Takahiro Uchida, Reiner Kirchheim, and Astrid Pundt — Friedrich-Hund-Platz 1, D-37077 Göttingen

Hydrogen absorption behavior was investigated by in-situ XRD for nano-crystalline Mg thin films at room temperature. Nanocrystalline Mg films with 20nm-thick Pd capping layer were prepared in an UHV chamber, by means of ion beam sputter deposition. XRD measurements using a Phillips X-Pert diffractometer with Co-K alpha radiation were performed before and after hydrogenation to check the phase transition and the change of the sample texture. Thickness changes of films before and after hydrogenation were measured by a Dektak 150 profiler in order to monitor the volume change due to the hydride formation. In-situ XRD measurements have been done at synchrotron facilities. Changes of the resistivity during hydrogenation were also monitored by four-point measurement, during hydrogen gas-loading at several pressures. Reaction kinetics of nano-crystalline Mg thin films with hydrogen at room temperature is estimated from in-situ synchrotron XRD measurements and compared with the results of in-situ electrical resistivity measurements and electrochemical hydrogen permeation measurements. Financial support by the DFG via PU131/9, HASYLAB and ESRF is gratefully acknowledged.