Berlin 2012 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 10: [DS] Focused electron beam induced processing for the fabrication of nanostructures I (focused session, jointly with O – Organizers: Huth, Marbach)

O 10.2: Topical Talk

Montag, 26. März 2012, 15:30–16:00, H 0111

Fabrication of 1 nm thick Carbon Nanomembranes using FEBIP — •Armin Gölzhäuser — Universität Bielefeld, Bielefeld, Germany

We employ a combination of molecular self-assembly and focused electron beam induced processing (FEBIP) to fabricate only 1 nm thick, but mechanically stable carbon nanomembranes (CNM). Self-Assembled Monolayers (SAMs) of amphiphilic biphenylthiols are formed on gold surfaces and then exposed to electron beams that lead to a C-H cleavage. The dehydrogenation is followed by a lateral cross-linking between neighboring molecules [1]. The resulting two-dimensional film can be released from the surface, forming a mechanically stable CNM with the thickness of the original monolayer, i.e. 1 nm [2]. We have developed procedures for the handling of CNMs, i.e. to transfer them onto arbitrary surfaces and to prepare them as freestanding films. It will be shown that free-standing CNMs can be used as supports for transmission electrons microscopy [3]. Free-standing CNMs also can act as substrates for a FEBIP fabrication of very small metal clusters [4].

[1] A. Turchanin et al. Langmuir 25, 7342 (2009).

[2] A. Turchanin et al. Adv. Mater. 21, 1233 (2009).

[3] C.T. Nottbohm et al. Ultramicroscopy 108, 885 (2008).

[4] W.F. van Dorp et al. Nanotechnology 22, 115303 (2011).