Berlin 2012 – scientific programme

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O: Fachverband Oberflächenphysik

O 26: Plasmonics and nanooptics II

O 26.3: Talk

Tuesday, March 27, 2012, 11:00–11:15, MA 005

Optical Force Stamping Lithography — •Spas Nedev, Alexander S. Urban, Andrey A. Lutich, and Jochen Feldmann — Ludwig-Maximilians-Universität München

Optical lithography techniques are widely used for fabrication of nanoscale devices. The ability to fabricate such structures with arbitrary size and shape is essential for their wide applications in optoelectronics, biological and medical sciences. The conventional far-field lithography is a diffraction limited technique which is not suitable for structures with lateral feature size beyond the diffraction limit. Some far-field lithography techniques can go beyond this limit, but they do not allow arbitrary pattern formation. Scanning near-field optical microscopy techniques can also be used for nanostructure production beyond the diffraction limit. However, they are characterized by low throughput, due to their scanning nature and pose restriction for maximal structure size.

Here we introduce a new optical lithography technique, optical force stamping lithography (OFSL) [1]. This approach employs optical forces on single nanoparticles in multiple focused Gaussian beams produced by a spatial light modulator. The so formed optical stamp provides rapid immobilization of single nanoparticles onto a substrate with positioning accuracy well beyond the diffraction limit. OFSL is not restricted to nanoparticle type or substrate. We believe that these evident advantages of the optical force stamping lithography will make it a standard tool for fabrication on nanodevices.

[1] Nano Lett., 2011, 11 (11), pp 5066-5070