Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 35: Poster Session II (Polymeric biomolecular films; Nanostructures; Electronic structure; Spin-orbit interaction; Phase transitions; Surface chemical reactions; Heterogeneous catalysis; Particles and clusters; Surface magnetism; Electron and spin dynamics; Surface dynamics; Methods; Electronic structure theory; Functional molecules)
O 35.13: Poster
Dienstag, 27. März 2012, 18:15–21:45, Poster B
Surface morphology of Silicon nanowires in dependence of different doping concentrations — •Stefan Weidemann, Ulrike Heiden, Jürgen Sölle, and Saskia Fischer — Neue Materialien, Institut für Physik, Humboldt-Universität zu Berlin, 12489 Berlin
Silicon nanowires (SiNWs) with rough surfaces have strongly decreased thermal conductivities and, hence, are promising candidates for thermoelectric devices [1]. However, the mechanism of formation of rough surfaces is still unclear and remains to be investigated. Here, we concentrate on producing NWs of defined length and study their structural and surface properties.
We fabricate SiNW arrays on wafer scale with tuneable lengths between 10-50 µm, and diameter in the range between 50-300 nm by the method of metal-assisted chemical etching [2]. We investigate the preparation of solid, rough and porous NW surfaces of different Boron-doped Si-substrates with resistivities of 5 mΩcm, 20Ωcm and >10kΩcm.
[1] A. I. Hochbaum et al., Nature 451, 163 (2008)
[2] M.-L. Zhang et al., J. Phys. Chem. C, 112 2008