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DPG

Berlin 2012 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 47: [DS] Micro- and nanopatterning (jointly with O)

Mittwoch, 28. März 2012, 11:45–13:45, H 0111

11:45 O 47.1 Investigation of the Fe incorporation in ion-beam induced patterning on Si (100) — •behnam khanbabaee, andreas biermanns, marina cornejo, dietmar hirsch, frank frost, and ullrich pietsch
12:00 O 47.2 Threshold sputter depth for nanopattern formation and "zero" sputter yield ion beam irradiation of amorphous carbon — •Omar Bobes, Kun Zhang, and Hans Hofsäss
12:15 O 47.3 Is silicide formation the decisive factor in impurity induced ion beam pattern formation?Sven Müller, •Martin Engler, Frank Frost, and Thomas Michely
12:30 O 47.4 Innovative FIB specific Nanopatterning Strategies for Optimized Photonic Crystal Nanofabrication — •Frank Nouvertne and Achim Nadzeyka
12:45 O 47.5 Photonic Crystal Gratings for High-Speed Energy-Efficient Laser Sources — •Philip Wolf, Werner Hofmann, Norbert Grote, and Dieter Bimberg
13:00 O 47.6 Nanopatterning by molecular polygons — •Stefan-Sven Jester, Eva Sigmund, Natalia Shabelina, Stephan M. Le Blanc, and Sigurd Höger
13:15 O 47.7 Rapid Prototyping of Hierarchical Gecko-Mimicking Nano- and Microstructures using Multiphoton Absorption — •Michael Röhrig, Michael Thiel, Matthias Worgull, and Hendrik Hölscher
13:30 O 47.8 Time and space resolved pump-probe investigations on induced ablation of thin films with femtosecond laser pulses — •Stephan Rapp, Matthias Domke, and Heinz P. Huber
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