Berlin 2012 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 91: [MA] Poster II
O 91.10: Poster
Freitag, 30. März 2012, 11:00–14:00, Poster A
Pulsed laser deposition of thin film Heusler compounds — •Mirko Emmel, Christian Mix, and Gerhard Jakob — Institut für Physik, Johannes Gutenberg-Universität Mainz, Deutschland
Pulsed laser deposition (PLD) is a versatile technique to deposit thin films of one or more targets illuminated by a focused pulsed-laser beam. Since the energy source is located outside the chamber, the use of ultra-high vacuum is possible. Due to a stoichiometric transfer between target and substrate, PLD allows depositing all kinds of multicomponent materials. We optimized the optical elements, which resulted in higher transmission of the laser energy and a more defined laser spot on the target. At a base pressure of about 10−9 mbar we successfully deposited thin films of different Heusler compounds. A further advantage of a PLD system is the capability to use relatively small targets, which are not suitable for other deposition methods like sputtering. The minimum diameter of a PLD-target is defined by the spot size of the laser on the target in order to avoid ablating other material. Hysteresis loops of Co2FeSi and Rh2MnGe thin film showed the expected magnetic saturation values. Ellipsometry measurements of Co2FeSi thin films were performed to determine the permittivity. This work is supported by the DFG research group ASPIMATT and the Stiftung Rheinland-Pfalz für Innovation.