Berlin 2012 – scientific programme
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O: Fachverband Oberflächenphysik
O 91: [MA] Poster II
O 91.33: Poster
Friday, March 30, 2012, 11:00–14:00, Poster A
Ion beam irradiation of interlayer exchange coupled trilayers in the sub-micron regime — •Roland Neb1, Thomas Sebastian1, Philipp Pirro1, Stefan Pofahl2, Rudolf Schäfer2, Bernhard Reuscher3, and Burkard Hillebrands1 — 1TU Kaiserslautern, Landesforschungszentrum Optimas, 67663 Kaiserslautern, Germany — 2IFW Dresden, 01069 Dresden, Germany — 3IFOS Kaiserslautern, 67663 Kaiserslautern, Germany
Focused ion beam irradiation is a well known tool for patterning thin film media. We use this tool to pattern an antiferromagnetically coupled Fe/Cr/Fe trilayer in the micron and sub-micron regime. The irradiated areas become ferromagnetic, allowing for the creation of well-defined ferromagnetic areas in an antiferromagnetically coupled environment. The suitability of such irradiated elements for information storage was investigated. We found that if certain conditions for the patterning process are met, sub-micron elements are able not only to store information but also to be overwritten by a sufficiently high magnetic field. The resulting bit density is strongly dependent on the applied ion dose, changing by a factor of 100 in the regime of 1014 to 1016 ions/cm2.
Financial support by the Deutsche Forschungsgemeinschaft, the Graduate School Material Science in Mainz and the Graduiertenkolleg 792 is gratefully acknowledged.