Berlin 2012 – scientific programme
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SYRS: Symposium Resistive Switching
SYRS 2: Poster: Resistive switching (jointly organized by DS, DF, KR, HL)
SYRS 2.41: Poster
Thursday, March 29, 2012, 17:30–19:00, Poster E
Towards nanofocusing of attosecond XUV pulses — •Christian Späth1, Alexander Guggenmos2, Soo Hoon Chew1, Kellie Pearce1, Michael Hofstetter2, Jürgen Schmidt1, and Ulf Kleineberg1 — 1Ludwig-Maximilians-Universität München, Fakultät Physik, 85748 Garching — 2Max-Planck-Institut für Quantenoptik, 85748 Garching
Attosecond pulses are finding more and more applications in measuring electron dynamics in atoms and molecules as well as electronic phenomena at surfaces and nanostructures. Nanofocusing of such pulses, for intensity enhancing at the sample position or for microscopic investigations, has not been successfully performed yet. We report on first towards diffractive polychromatic nanofocusing optics for XUV pulses at 90 eV photon energy.
Circular and elliptical zone plate structures have been written by advanced e-beam lithography in different resists (PMMA and HSQ) on ultrathin Si3N4 membrane windows.
Combining diffractive with refractive lenses on the same element results in increased usable bandwidth as required for focusing of sub femtosecond pulses. We will discuss the capabilities and limitations of these new optics and report first steps towards their experimental fabrication.