Stuttgart 2012 – scientific programme

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P: Fachverband Plasmaphysik

P 12: Poster: Plasma-Wand-Wechselwirkung

P 12.2: Poster

Tuesday, March 13, 2012, 16:30–19:00, Poster.III

Energy balance at the substrate during magnetron sputter deposition of ZnO — •Sven Bornholdt¹, Naho Itagaki², Kazunari Kuwahara², Harm Wulff³, Masaharu Shiratani², and Holger Kersten¹ — ¹Institute of Experimental and Applied Physics, Christian-Albrechts-University of Kiel, D-24098 Kiel, Germany — ²Institute of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan — ³Institute of Physics, University Greifswald, D-17487 Greifswald, Germany

The improvement of the crystalline structure of ZnO thin films deposited by PVD processes is very important for industrial manufacturing of solar cells. The description of the particle and energy fluxes and their effect on the energy balance at the substrate surface and for the resulting film properties is of essential interest. Calorimetric measurements at the substrate position were carried out in a rf-triode magnetron sputter deposition system with ceramic ZnO targets using different gas mixtures (Ar/N₂ and Ar/H₂). By variation of the probe bias the different contributions originating from the kinetic energy of charge carriers, the recombination of charge carriers at the surface as well as the contributions from impact of neutral sputtered particles and subsequent film growth are determined. Radial scans in the substrate plane were recorded for inhomogeneities in the total energy influx. Film properties like crystalline structure, growth rate and grain size were investigated using XRD and XRR. Especially the growth rate has been found to be sensitively dependent on the substrate temperature.