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P: Fachverband Plasmaphysik

P 13: Poster: Niedertemperaturplasmsen

P 13.11: Poster

Dienstag, 13. März 2012, 16:30–19:00, Poster.III

Simulation study of capacitive hydrogen discharges using asymmetric voltage waveforms — •Sebastian Mohr, Edmund Schüngel, Julian Schulze, and Uwe Czarnetzki — Ruhr-Universität Bochum

Capactive RF-discharges are commonly used for surface treatments like the deposition of thin films. For industrial applications, the independent control of the ion flux to and the mean energy of the ions impinging on the surfaces is desired. Experiments [1] and 1D3v-PIC/MCC-simulations [2] have shown, that this independent control is possible by applying a fundamental frequency and its second harmonic to the powered electrode. This way, even in geometrically symmetric discharges, as they are often used in industrial reactors, a discharge asymmetry can be induced electrically, hence the name Electrical Asymmetry Effect (EAE). The asymmetry and, therefore, the ion energy can be controlled by the phase between the two frequencies. Many industrial processes require gas mixtures containing hydrogen, e.g. hydrogen-silane discharges to deposit silicon films. We simulate electrically asymmetric discharges containing hydrogen using the Hybrid Plasma Equipment Model (HPEM) [3]. First results are presented and unique effects such as field reversals, which may occur in hydrogen discharges, are discussed. Funding by the German Ministry for the Environment (0325210B)

[1] J. Schulze J. Phys. D FTC 42 092005

[2] Z. Donkó J. Phys. D 42 025205

[3] M. Kushner J. Phys. D 42 194013