Stuttgart 2012 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 14: Poster: Plasmatechnologie

P 14.11: Poster

Mittwoch, 14. März 2012, 16:30–19:00, Poster.III

Cross-linking of polydimethylsiloxane thin films in hydrogen CCRF plasma — •Vladimir Danilov, Hans-Erich Wagner, and Jürgen Meichsner — University of Greifswald, Institute of Physics, Felix-Hausdorff-Str. 6, 17487 Greifswald

The cross-linking of thin composite films from suspension of liquid polydimethylsiloxane (PDMS) and functional nanoparticles, e.g. Ag, TiO2, in low pressure capacitively coupled RF plasma in hydrogen was investigated. This method exhibits high potential for developing of innovative coatings with antibacterial, anticorrosion or photocatalytic properties. The thin PDMS films were spin-coated on glass substrates covered by aluminium. Their thickness was varied between 10 nm and 600 nm. The plasma modification was performed in CCRF plasma in hydrogen. In this case the main factor affecting the film modification is the VUV radiation, which intensity was studied depending on the total pressure and RF power. The corresponding chemical modification of the thin PDMS films was investigated by FT-IRRAS under variation of the plasma treatment time and initial film thickness. Furthermore, the film shrinkage was determined by spectroscopic ellipsometry. By comparison of all results it was found that the plasma modified films consist of strongly compressed methyl-free SiOx top layer (10-50 nm), followed by partially demethylated region with moderate film shrinkage, and an underlying weakly-modified PDMS layer.

Funded by the Volkswagen Foundation, Plasma Hybrid Coating, grant no. I/83275.