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P: Fachverband Plasmaphysik

P 14: Poster: Plasmatechnologie

P 14.1: Poster

Mittwoch, 14. März 2012, 16:30–19:00, Poster.III

Variation of the cluster size distribution with target aging measured in planar DC magnetron sputtering source — •Marina Ganeva¹, Andrei V. Pipa², and Rainer Hippler¹ — ¹Institute of Physics, University Greifswald, Felix-Hausdorff-Str. 6, 17487 Greifswald, Germany — ²Leibniz-Institut für Plasmaforschung und Technologie e.V., Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany

Magnetically confined magnetron discharges are frequently used as a source of nanoparticles [1,2]. Most applications require a stable cluster beam with a well-defined size distribution. The peculiarity of the planar magnetron operation is a non-uniform (V-shaped) target erosion due to the sputtering by ions from the plasma. Normally the target is replaced when the depth of the erosion groove reaches the target thickness. Our systematic investigations show that the cluster size distribution and intensity changes continuously during the target lifetime. For reproducible measurements target erosion has to be taken into account. The cluster ion intensity abruptly drops to zero, once a critical point is reached. This happens long before the end of the target's lifetime is reached. We interpret this behavior as being caused by the changing angle of ion incidence as function of the erosion time [3].

[1] S.R. Bhattacharyya et. al., J. Phys. D: Appl. Phys. 42 (2009) 035306

[2] I. Shyjumon et. al., Eur. Phys. J. D 37, (2006), p. 409

[3] M. Ganeva, R. Hippler (2011) Verhandl. DPG(VI) 46, 4, p. 45.