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P: Fachverband Plasmaphysik

P 14: Poster: Plasmatechnologie

P 14.8: Poster

Mittwoch, 14. März 2012, 16:30–19:00, Poster.III

Nonlinear dynamics of sheath voltage characteristics for arbitrary waveforms in capacitive discharges — •Abd Elfattah Elgendy, Mohammed Shihab, Denis Eremin, Thomas Mussenbrock, and Ralf Peter Brinkmann — Institute for Theoretical Electrical Engineering, Ruhr University Bochum, Center for Plasma Science and Technology, D-44780 Bochum, Germany

The dynamics of capacitively coupled RF discharges (RF-CCPs) is controlled by the sheath voltage characteristics; this characteristic depends itself on the details of the RF modulation. We study this dependence on the basis of a collision-dominated fluid model affected by arbitrary waveforms. Comparison of collisonal fluid model with a much more demanding particle-in-cell (PIC) simulation yield good agreement; the nonlinear sheath voltage characteristics at low computational effort are quite reliable and the tailoring of ion energy distribution functions by arbitrary waveforms are less effective in collision regime.