Stuttgart 2012 – scientific programme

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P: Fachverband Plasmaphysik

P 20: Poster: Diagnostik

P 20.3: Poster

Thursday, March 15, 2012, 16:30–19:00, Poster.III

Time-resolved diagnostics of advanced pulsed magnetron sputtering discharges at low pressures — •Steffen Drache¹, Vitezslav Stranak¹, Ann-Pierra Herrendorf¹, Martin Cada², Zdenek Hubicka², and Rainer Hippler¹ — ¹Ernst-Moritz-Arndt-Universität Greifswald, Institut für Physik, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany — ²Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Prague, Czech Republic

The properties of electrons and ions in a Ti-Cu high power impulse magnetron sputtering (HiPIMS) discharge combined with pulse operated mid-frequency excitation were studied. The setup allows operation at pressures one order of magnitude lower than in conventional systems. A Langmuir Probe (LP) was used to obtain the electron energy probability function (EEPF) and information regarding the time development of electron density and mean electron energy. Optical emission spectroscopy (OES) was employed to identify active plasma species and differences regarding the ionization of plasma constituents in different pressure regimes. Optical emission imaging (OEI) was used to investigate the temporal and spatial behavior of excited particles. Time-averaged as well as time-resolved measurements with a retarding field energy analyzer (RFA) were performed to determine the ion velocity distribution function (IVDF) at the substrate position during the discharge. The IVDF is an important parameter, since the thin film properties are strongly influenced by the energy of sputtered and deposited metal ions.