Stuttgart 2012 – scientific programme
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P: Fachverband Plasmaphysik
P 23: Plasmatechnologie I (Niederdruckkonzepte)
P 23.5: Talk
Friday, March 16, 2012, 12:10–12:25, V57.01
Double ICP plasma jet source: theory and experiment — •Horia-Eugen Porteanu1, Roland Gesche1, and Klaus Wandel2 — 1Ferdinand-Braun-Institut, Berlin, Germany — 2SENTECH Instruments GmbH, Berlin Germany
Microwave plasma jets are intended to replace large volume RF plasma reactors, used in the semiconductor technology, due to less power and material consumption. The plasma jet does not interact with the reactor walls therefore the purity of plasma is higher than in the case of RF reactors. However, the active area is limited by the relatively small diameter of the jet. Therefore the next step is the development of a plasma jet array. After the successful development of the single ICP jet source for 3 mm and 7mm diameter ceramic tubes we developed a double ICP source . Two one-turn-coils and a common capacitor form the microwave resonator. We performed a simulation using the plasma module of Comsol. The physics combines gas flow, electromagnetics and plasma contributions. The simulation gives the time evolution of the plasma parameters during the ignition and their dependence on microwave power and gas flow. The double ICP source have been experimentally tested with Argon and Oxygen. At a working pressure of 20 Pa and a gas flow of 250 sccm we get an Oxygen plasma jet in both tubes using 20 W microwave power at 2.45 GHz. 80 % of the microwave power is transmitted to plasma; for Argon in similar conditions only 40%.