Stuttgart 2012 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 7: Diagnostik (von Niedertemperaturplasmen)

P 7.1: Hauptvortrag

Dienstag, 13. März 2012, 10:30–11:00, V57.01

Implanted noble gas atoms as a tool for structure determination of plasma-deposited thin films using X-ray photoelectron spectroscopy — •Teresa de los Arcos, Andreas Will, Marina Prenzel, Achim von Keudell, and Jörg Winter — Ruhr-Universität Bochum

Most plasma-based thin film deposition methods employ noble gases, either pure or in mixtures with reactive components. As a consequence, some amount of gas is often implanted within the deposited thin film. Although noble gases will not form chemical bonds with the host matrix atoms, their electronic shells can nevertheless react to their environment according to different effects (compression of electronic orbitals, shielding by conduction band electrons in the host, etc.). We have initiated [1] a systematic study of Ar implanted within different matrix materials (metals, semiconductors and oxides), that shows how the precise determination and correct interpretation of the binding energy levels of core electrons from the implanted gas atoms can provide information about their local environment using X-ray photoelectron spectroscopy (XPS). An application of particular interest is the ability to distinguish the presence of crystalline or amorphous structure in thin Al2O3 deposited by magnetron sputtering. This work is funded by the DFG within the framework of the SFB-TR 87.

[1] A. Rastgoo Lahrood, T. de los Arcos, M. Prenzel, A. von Keudell, and J. Winter, Thin Solid Films 520, 1625 (2011)