Jena 2013 – scientific programme
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P: Fachverband Plasmaphysik
P 10: Poster: Plasmadiagnostik
P 10.18: Poster
Wednesday, February 27, 2013, 16:30–18:30, Poster EG
FTIR spectroscopy studies of aluminium tri-isopropoxide (ATI) in an rf plasma — Marko Hübner1, •Maik Fröhlich2, Hagop Tawidian3, Maxime Mikikian3, Holger Kersten2, and Jürgen Röpcke1 — 1Leibniz Institute for Plasma Science and Technology e.V. (INP), D-17489 Greifswald, Germany — 2Institute of Experimental and Applied Physics, Kiel University, D-24098 Kiel, Germany — 3GREMI, UMR 7344, CNRS/Université d'Orléans, 45067 Orléans Cedex 2, France
Metal oxide films are widely used in a variety of products. Their properties make them interesting for a growing field of applications. Due to their hardness, chemical resistance and low conductivity, they are applied e.g. in the production of cutting tools, in solar cells or in OLEDs. The metal oxide layers can be deposited using plasma-enhanced chemical vapour deposition (PECVD). Thus, the properties of the layer are governed by the plasma induced chemistry.
In this work aluminum tri-isopropoxide (ATI) containing plasmas were investigated, typically used for the deposition of alumina based coatings. An FTIR-study of the plasma volume, including the ATI molecules and 6 by-products, has been done for an Ar / ATI and Ar / N2 / ATI gas mixture. The absolute concentration and the degree of dissociation of the ATI-molecules as well as the fragmentation efficiency and fragmentation rate have been calculated and, thereby, exhibit important information about the plasma chemistry.