Jena 2013 – scientific programme
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P: Fachverband Plasmaphysik
P 11: Poster: Niedertemperaturplasmen
P 11.18: Poster
Wednesday, February 27, 2013, 16:30–18:30, Poster EG
Attachment cross sections of C4F8O estimated from swarm measurements in Ar, N2 or CO2 buffer gas — •Dominik A Dahl and Christian M Franck — High Voltage Laboratory, ETH Zurich, Schweiz
Recently C4F8O became commercially available as a cleaning agent for plasma deposition chambers. C4F8O could also be considered for high voltage insulation applications. It seems that electron interactions with C4F8O have not been investigated yet.
Using the pulsed Townsend method we measured the electron swarm parameters of highly diluted (≤ 1.2%) C4F8O in the buffer gases Ar, N2 or CO2. We will show the results of a linear response analysis of our swarm data. The attachment cross sections of C4F8O have been estimated on the basis of qualitative and comparative evaluations of the response data. Using numerical methods we determined the corresponding attachment rates, and we compare the numerical results to our experimental data.