Jena 2013 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

SYLL: Symposium Aktuelle Entwicklungen von Hochleistungslasern und deren Anwendungen

SYLL 2: Hochleistungslaser und deren Anwendungen II

SYLL 2.3: Invited Talk

Wednesday, February 27, 2013, 17:30–18:00, HS 4

A single frequency laser at 191 nm — •Jürgen Stuhler, Matthias Scholz, Dmitrijs Opalevs, and Wilhelm Kaenders — TOPTICA Photonics AG, Gräfelfing, Germany

We present a cw narrow linewidth deep-UV source at 191 nm, consisting of a grating-stabilized diode laser which is frequency-quadrupled by two consecutive second harmonic generation (SHG) stages.

In the first SHG stage, the fundamental light at 764 nm is resonantly enhanced and frequency doubled to 382 nm in a lithium triborate (LBO) crystal. The resulting uv light is beam shaped and enhanced in the second SHG stage. Using the novel crystal potassium fluoroboratoberyllate (KBBF) [1], an output power of up to 1.3 mW at 191 nm is achieved [2]. The linewidth of the laser output at 191 nm (1570 THz) is estimated to be below 300 kHz (1 km coherence length). Automatic fine tuning of the laser up to 40 GHz and coarse wavelength changes of 1 nm are possible. Similar techniques should provide wavelengths between 165 nm and 205 nm.

The demonstrated light source is a unique tool for deep-UV metrology, photoemission spectroscopy or atomic spectroscopy.

[1] C. Chen et al., "Deep-UV nonlinear optical crystal KBe2BO3F2 - discovery, growth, optical properties and applications", Appl. Phys. B 97, 9-25 (2009).

[2] M. Scholz et al., "A 1.3-mW Tunable and Narrow-Band Continuous-Wave Light Source at 191 nm", OPTICS EXPRESS 20, No. 17, 18659-18664 (2012).