Regensburg 2013 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 19: Poster: Crystallization, Nucleation and Self Assembly
CPP 19.8: Poster
Dienstag, 12. März 2013, 18:15–20:15, Poster C
Polymer blend lithography: A versatile method for fabricating nanopatterned self-assembled monolayers — Cheng Huang1,2, Markus Moosmann1,2, Jiehong Jin1,2, Tobias Heiler1,2, •Paul Vincze1,2, Stefan Walheim1,2, and Thomas Schimmel1,2 — 1Institute of Nanotechnology, Karlsruhe Institute of Technology — 2Institute of Applied Physics and Center for Functional Nanostructures, Karlsruhe Institute of Technology
Polymer blend lithography is introduced as a rapid method to produce patterned self-assembled monolayers on solid substrates featuring different chemical functionalities. For the pattern generation the phase separation of two immiscible polymers, polystyrene (PS) and poly(methylmethacrylate) (PMMA), as a blend solution is used for coating by a spin-coating process. By controlling the spin-coating parameters and conditions, including the humidity, the molar mass of the PS and PMMA, and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology can be reproducibly induced. By selectively dissolving one component, a monolayer copy of the corresponding polymer phase morphology can be created. The patterning process is applied with various functional molecules forming self-assembled monolayers (SAM). This process is suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates [1].
[1] Huang, C.; Moosmann, M.; Jin, J.; Heiler, T.; Walheim, S.; Schimmel, T. Beilstein J. Nanotechnol. 2012, 3, 620-628. doi:10.3762/bjnano.3.71