Regensburg 2013 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 30: Poster: Focus: Wetting on smooth and rough surfaces: From spreading to superhydrophobicity

CPP 30.13: Poster

Mittwoch, 13. März 2013, 16:30–18:30, Poster C

Patterning of YVO4:Eu3+ luminescent films by soft lithography — •Wenxin Wang¹, Ziyong Cheng², Jun Lin², and Yong Lei¹ — ¹Fachgebiet 3D-Nanostrukturierung, Institut fuer Physik & IMN MacroNano (ZIK), Institute for Physics and IMN MacroNano (ZIK), Technische Universitaet Ilmenau, Prof. Schmidt Str. 26, 98693 Ilmenau, Germany — ²State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, P.R.China

Ordered square and dot luminescent YVO4:Eu3+ array patterns were fabricated by two kinds of soft lithography processes, namely, microtransfer molding (uTM) and microcontact printing (uCP), respectively. Both soft-lithography processes utilize a PDMS elastomeric mold as the stamp combined with a Pechini-type sol-gel process to produce luminescent patterns on quartz plates. The difference is that square pattern can be direct obtained via uTM, but with method of uCP, we print hydrophobic SAMS on the hydrophilic quartz to induce the dewetting process of sol precursor to form dot pattern array. The ordered luminescent YVO4:Eu3+ patterns are revealed by optical microscopy and their microstructures, consisting of nanometer-scale particles, is unveiled by scanning electronic microscopy (SEM) observations. Additionally, photoluminescence and cathodoluminescence were carried out to characterize the patterned YVO4:Eu3+ samples.