Regensburg 2013 – scientific programme
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 9: Poster: Interfaces and Thin Films (joint session with DECHEMA and VDI)
CPP 9.15: Poster
Monday, March 11, 2013, 17:30–19:30, Poster C
Improvement of the lamellar structure in block copolymer thin films by solvent vapor treatment — Alessandro Sepe1, Dorthe Posselt2, Kasper Swiatek2, Jianqi Zhang1, Sebastian Jaksch1, Richard Steinacher1, Jan Perlich3, Detlef-M. Smilgies4, and •Christine M. Papadakis1 — 1TU München, Physik-Department, Physik weicher Materie, Garching — 2IMFUFA, Department of Science, Systems and Models, Roskilde University, Denmark — 3HASYLAB at DESY, Hamburg — 4Cornell High Energy Synchrotron Source, Cornell University, Ithanca NY, USA
Defects in nanostructured block copolymer thin films are often annealed by solvent vapor treatment. We have studied the structural ordering in lamellar poly(styrene-b-butadiene) thin films during exposure to cyclohexane vapour and subsequent drying using X-ray reflectometry and in-situ, real-time grazing-incidence small-angle X-ray scattering [1]. The films had initially the parallel lamellar orientation and were subject to two swelling/drying cycles. We found that the lamellar order after this treatment is best when (i) a well-correlated parallel lamellar orientation is obtained during the first swelling cycle and (ii) when the film is dried at a sufficiently slow rate.
1. Z. Di, D. Posselt, D.-M. Smilgies, C.M. Papadakis, Macromolecules 43, 418 (2010).
2. Z. Di, D. Posselt, D.-M. Smilgies, C.M. Papadakis et al., Macromolecules 45, 5185 (2012).