Regensburg 2013 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 9: Poster: Interfaces and Thin Films (joint session with DECHEMA and VDI)

CPP 9.25: Poster

Monday, March 11, 2013, 17:30–19:30, Poster C

Fabrication of carbon nanomembranes by helium ion beam lithography — •Xianghui Zhang, Henning Vieker, André Beyer, and Armin Gölzhäuser — Fakultät für Physik, Universität Bielefeld, Postfach 10 01 31, 33501 Bielefeld, Germany

The scanning helium ion microscope (HIM) has been recently employed as an imaging and metrology tool for nanotechnology. In addition, the helium ion beam is capable of creating nano-sized patterns and performing nanofabrication as commonly done in a focused ion beam (FIB) system. It is known that aromatic self-assembled monolayers (SAMs) can be cross-linked due to electron irradiation and form mechanically stable carbon nanomembranes (CNMs). Here we use a helium ion beam as direct writing tool to cross-link 4'-nitro-1,1'-biphenyl-4-thiol (NBPT) SAMs with arbitrary patterns. The cross-linked SAMs were transferred to either silicon substrates with an oxide layer or transmission electron microscopy (TEM) grids for further characterizations or applications. After being transferred, the evolution of SAM's crosslinking process could be investigated by the HIM imaging. Formation of wormlike morphology with preferential directions indicates that the crosslinking starts from the energetically favorable sites, such as molecular domains with certain crystalline orientation. Furthermore, we also use the ion beam to form nanopores in the CNM with an attainable feature size of 5 nm.