Regensburg 2013 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 9: Poster: Interfaces and Thin Films (joint session with DECHEMA and VDI)

CPP 9.42: Poster

Montag, 11. März 2013, 17:30–19:30, Poster C

Distribution of Gold Nanoparticles within patterns of Polymer Brushes using UV lithography — •Stephanie Christau, Jianli Zhao, and Regine von Klitzing — Stranski-Laboratorium für Physikalische und Theoretische Chemie, Institute for Chemistry, Technical University Berlin, Straße des 17. Juni 124, 10623 Berlin, Germany

The distribution of Gold Nanoparticles (AuNPs) in polymer brushes which are grafted from planar silicon surfaces is of big interest in the last few years. The reason is that polymer brushes are promising candidates for the ordering of particles and AuNPs will induce interesting optical properties.

Polymer brushes of (N,N-dimethylamino)ethyl methacrylate (DMAEMA) and N-isopropylacrylamide (NIPAM) are grown from a 2-bromo-2-methyl-(3-(triethoxysilyl)propyl propanamide (BTPAm)-covered silicon surface via surface-initiated atom transfer radical polymerization (SI-ATRP). For the synthesis of both initiator-covered self-assembled monolayer (SAM) and polymer brushes a new type of sealed reactor is used that provides a constant nitrogen flux. The grafted chains are investigated using ellipsometry, atomic force microscopy (AFM), X-ray reflectometry, scanning electron microscopy (SEM) and gel permeation chromatography (GPC).

To study the influence of the polymer's chemical composition, the brush thicknesses and the conformation on the particle distribution, grid-like patterns of polymer brushes are formed using UV litography. Different approaches for patterning are adressed.