Regensburg 2013 – scientific programme

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 9: Poster: Interfaces and Thin Films (joint session with DECHEMA and VDI)

CPP 9.7: Poster

Monday, March 11, 2013, 17:30–19:30, Poster C

Preparation conditions influence dewetting behavior of thin polymer films — •Mischa Klos, Matthias Lessel, and Karin Jacobs — Saarland University, Experimental Physics, 66041 Saarbruecken, Germany

Dewetting of thin polymer films on smooth substrates like silicon wafers can be influenced by many factors such as intrinsic material and surface parameters, the film itself and even the quality of the substrate. So the sample preparation is a crucial step in the entire experiment. Reliable results are only achieved by fully characterized systems, which implicates perfect cleaning. Silicon wafers are common substrates to study the flow dynamics of polymer film. Since they feature a very high surface energy, also dust, dirt, impurities or differences in the preparation procedure have an influence on the quality of the surfaces. Dust for example can act as a nucleation core on the on hand and on the other hand, depending on the density, it can stabilize the film due to pinning. We show a comparison of different preparation and cleaning methods for silicon surfaces and their impact on the stability of thin polystyrene films.