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DF: Fachverband Dielektrische Festkörper

DF 22: Poster II

DF 22.24: Poster

Freitag, 15. März 2013, 10:30–13:30, Poster D

Preparation and characterization of ultrathin Ni films on W(110): electronic structure and magnetism — •Henry Wortelen¹, Anke B. Schmidt¹, Martin Weinelt², and Markus Donath¹ — ¹Physikalisches Institut, Westfälische Wilhelms-Universität Münster, 48149 Münster — ²Fachbereich Physik, Freie Universität Berlin, 14195 Berlin

An effective way to study the electronic structure of the band ferromagnet nickel at the magnetic phase transition is to lower the Curie temperture by going from bulk samples to ultrathin films.

In this contribution, we present a comprehensive investigation of ultrathin nickel films grown on W(110), as the film thickness is reduced from 10 to 1 monolayer. A combined study with scanning tunneling microscopy, low-energy electron diffraction, magneto-optic Kerr effect, and spin-resolved inverse photoemission reveals the close relation between film thickness, morphology, electronic structure, and magnetism. Our results indicate changes in coercivity, spin asymmetry, and spectral intensity of surface states as a function of film thickness and quality.