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DS: Fachverband Dünne Schichten

DS 11: Poster Session I: Application of thin films; Ion beam induced surface patterns; Ion and electron beam induced processes; Micro- and nanopatterning (jointly with O)

DS 11.12: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Ion beam enhanced etching of LiNbO₃ containing silver nano clusters for plasmonic waveguide applications — •Felix Felgenträger, Jura Rensberg, Steffen Milz, Carsten Ronning, and Werner Wesch — Institute of Solid State Physics, Friedrich Schiller University Jena

Plasmonic structures, consisting of nanometer sized metal clusters embedded in dielectric host materials, have been in the point of interest for the last two decades, due to their wide range of possible applications, like sensing, fast information transfer and the confinement of light. One of the most promising combinations for new plasmonic devices is lithium nobiate (LiNbO₃) as host material and incorporated noble metal nano clusters i.e. silver because of its distinct surface plasmon resonance in the visible range. In this contribution LiNbO₃ was implanted with a high amount of Ag⁺ ions to form embedded Ag clusters. In situ as well as post implantation annealing was carried out to reduce radiation damage and recover the structure of the host material due to the preferential etching of amorphous LiNbO₃ with HF during waveguide fabrication. Argon ions were implanted selectively through a mask of photoresist prepared by standard photolithography for the ion beam enhanced etching step. Consequently µm-seized waveguide structures are formed by the unirradiated parts after etching. Cross-sectional STEM investigations were made in order to determine the waveguide structure and cluster size distribution. The optical properties of the Ag clusters were examined by the means of polarization-dependent UV-VIS absorption spectroscopy.