Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 11: Poster Session I: Application of thin films; Ion beam induced surface patterns; Ion and electron beam induced processes; Micro- and nanopatterning (jointly with O)

DS 11.15: Poster

Monday, March 11, 2013, 17:00–20:00, Poster B1

Influence of electron beam parameters on the composition and conductivity of deposits prepared via focused electron-beam-induced deposition — •Paul M. Weirich, Marcel Winhold, Christian H. Schwalb, and Michael Huth — Physikalisches Institut, Goethe-Universität, Max-von-Laue-Str.1, 60438 Frankfurt am Main

Focused electron-beam-induced deposition (FEBID) is a high resolution one-step technique, which allows producing micro- and nanostructures. In many cases it becomes necessary to prepare structures with a high metal content, e.g. for contacting nanowires which for many precursors strongly depends on the deposition parameters. For the precursor tungsten hexacarbonyl W(CO)₆ it has already been shown, that the metal content of the deposits can be tuned by changing the electron beam parameters acceleration voltage and beam current [1]. Based on those experiments we further investigated the influence of the scanning parameters of the electron-beam - dwell-time and pitch - on conductivity and metal content of the tungsten deposits. The deposits were analyzed by means of in-situ electrical conductivity measurements, energy dispersive X-ray spectroscopy, atomic force microscopy and electrical transport measurements. The results show that by choosing the ideal combination of scanning parameters the metal content of the deposits can be raised from 25 at% up to 40 at% which leads to an increase of conductivity by almost two orders of magnitude.

[1] F. Porrati, R. Sachser and M. Huth, Nanotechnology 2009, 20, 195301