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DS: Fachverband Dünne Schichten

DS 11: Poster Session I: Application of thin films; Ion beam induced surface patterns; Ion and electron beam induced processes; Micro- and nanopatterning (jointly with O)

DS 11.18: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Optimization and characterization of liquid metal ion sources for focused ion beam technology — •Alexander Schwinger, Rüdiger Schott, and Andreas D. Wieck — Lehrstuhl für angewandte Festkörperphysik, Ruhr-Universität Bochum

Focused ion beam devices are widely used for maskless ion implantation and milling on a nanometer scale. In order to increase the performance and stability of liquid metal ion sources (LMIS) commonly used in focused ion beam (FIB) systems, we produced and compared multiple needle type LMIS. Preparation of tip and surface of the LMIS was done by gradual electrochemical etching of tungsten wire, the resulting surface topology and tip geometry were investigated with SEM. After filling the LMIS with the source material, the dependency of the emitted ion current on the extraction voltage was measured. Long-term emission stability was then evaluated by measuring the variation of the ion current over time while applying a constant extraction voltage.