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DS: Fachverband Dünne Schichten

DS 13: Poster Session III: Layer properties: electrical, optical and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM; XPS, SIMS, RBS..)

DS 13.18: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Epitaxy of Ultrathin Metal Films for Ultrafast Electron Diffraction and Plasmonics — •T. Becker, S. Meyer, T. Payer, F.-J. Meyer zu Heringdorf, and M. Horn-von Hoegen — University Duisburg-Essen, Duisburg, Germany

Monocrystalline metal films on halogenide salt substrates and mica were epitaxially grown to produce electron transparent, free-standing membranes with few 10 nm thickness for ultrafast transmission electron diffraction respectively thicker films for use in plasmonic excitation. Au, Co and Fe films with various thicknesses from 20 nm to 100 nm were deposited under UHV conditions by molecular beam epitaxy in a temperature range from -100 ^∘C to 470 ^∘C on clean and atomically plain NaCl or KCl substrates that were prepared as described in [1]. The mica substrates were cleaved. The morphology was examined using in-situ LEED and ex-situ AFM. Cobalt forms 3D islands in the µm-regime. Continuous iron films with a rms surface roughness of less than 1 nm were obtained after annealing at 330 ^∘C for one hour. For Au on KCl another type of growth was observed. In the whole temperature range 3D islands with different diameters and heights up to 140 nm are dominating the surface structure. To obtain closed monocrystalline Au films with rms surface roughness below 1 nm, Au was deposited at 250 ^∘C on a mica substrate.

[1] T.Payer et al., Appl. Phys. Lett. 93, 093102 (2008)