Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 13: Poster Session III: Layer properties: electrical, optical and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM; XPS, SIMS, RBS..)

DS 13.3: Poster

Monday, March 11, 2013, 17:00–20:00, Poster B1

Prozess characteristics and film properties upon doping of TiO₂ by reactive serial co-sputtering utilizing high power impuls magnetron sputtering — •Rüdiger M. Schmidt¹, Oliver Lenck², Tomas Kubart³, Dominik Wagner¹, Andreas Pflug², Thomas Nyberg³, Sören Berg³, and Matthias Wuttig¹ — ¹I. Institute of Physics, RWTH Aachen University, Germany — ²Fraunhofer IST, Braunschweig, Germany — ³Solid State Electronics, The Ångström Laboratory, Uppsala University, Sweden

Titanium Dioxide (TiO₂) is a material with attractive properties which have led to various applications such as anti-reflective coatings or self cleaning surfaces. High power impulse magneton sputtering (HiPIMS) is a PVD technique in which the power is applied to the target with low duty cycle (<10%) and frequenzy (<10 kHz) resulting in a high degree of ionization of the sputtered species. As a result, films deposited by HiPIMS show smooth surfaces and high densities. Unfortunatly the deposition of TiO₂ using HiPIMS is hampered by significantly lower deposition rates compared to dcMS. Sputter Yield Amplification (SYA) can be used, through recoil of the sputtering species at implanted heavy dopants below the target surface, to increase deposition rates. We have built a designated sputter deposition tool which enables systematic studies of different dopants. In this study TiO₂ is doped with Tungsten and Tantalum resulting in a rate increase of 250-400% and 180-320% respectively. Optical measurements in the visible range show that the absorption of TiO₂:Ta is less than 0.5%, whereas TiO2:W shows a somewhat higher absorption.