Regensburg 2013 – scientific programme
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DS: Fachverband Dünne Schichten
DS 30: Thin Film Characterization: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS,...) II
DS 30.8: Talk
Thursday, March 14, 2013, 16:30–16:45, H32
Quantitative Analysis of REELS Spectra and Modeling of Optical Properties of Multilayer systems for EUV Radiation Regime — Evelyn Handick1, •Sina Gusenleitner1,2, Dirk Hauschild1,3, Tina Graber2, Dirk Ehm2, and Friedrich Reinert1,3 — 1Physikalisches Institut, Experimentelle Physik VII, Universität Würzburg, 97074 Würzburg — 2Carl Zeiss SMT GmbH, 73447 Oberkochen — 3Karlsruhe Institut für Technologie, Gemeinschaftslabor für Nanoanalytik, 76021 Karlsruhe
Multilayer mirrors (MLM) are widely used in the extreme ultraviolet (EUV) radiation regime for various applications, but their lifetime suffers from degradation through contamination. Diverse capping layers can be used to terminate EUV MLM to protect the underlaying multilayer stack. One very promising caping material is Ru. In order to understand the time dependent influence of contaminations on these Ru capped MLM particular heterosystems were investigated with Reflection Electron Energy Loss Spectroscopy (REELS). Analysis of the REELS spectra lead to determination of the dielectric function and various optical properties in the EUV photon energy regime which are not easily accessible by optical measurements. Furthermore, the influence of different cleaning procedures, such as Ar+ ion sputtering or atomic hydrogen cleaning, on the electronic and optical properties of the systems are monitored. Comparison of these findings with results for Ru single crystal surfaces, show the connection between the model system and the application oriented polycrystalline Ru thin-film on the heterostructure.