Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 32: Poster Session IV: Atomic layer deposition; Organic thin films; Organic Electronics and Phototovoltaics; Organic Materials for Spintronics - from spinterface to devices; Thin film photovoltaic materials and solar cells

DS 32.10: Poster

Thursday, March 14, 2013, 17:00–20:00, Poster B2

Growth Study of Organic Thin Films - Influence of Different Growth Conditions on Structure and Morphology — •Janina Felter, Daniel Gebauer, and Matthias Wuttig — I. Institute of Physics (IA), RWTH Aachen University, D-52056 Aachen, Germany

The molecule N,N'-ditridecyl-3,4,9,10-perylenetetracarboxylic diimide (PTCDI-13) is one of the few organic materials with good n-type conductivity. Hence this compound is attractive for the application in organic thin film transistors (OTFT). In order to optimize its thin film properties and to access the full potential of this molecule, the physical processes of growth and structure formation have to be investigated. In this work PTCDI-C13 films with a thickness varying from the submonolayer regime up to 60 nm have been deposited by organic molecular beam deposition (OMBD) on gold and SiO2 surfaces. The deposition rate and the substrate temperature have been varied to study the influence of different growth conditions on structure and morphology. X-ray reflectometry (XRR) has been applied in order to measure thin film thickness and roughness. The crystallinity and texture have been determined by X-ray diffractometry (XRD), while the surface morphology has been investigated by atomic force microscopy (AFM).