Regensburg 2013 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 32: Poster Session IV: Atomic layer deposition; Organic thin films; Organic Electronics and Phototovoltaics; Organic Materials for Spintronics - from spinterface to devices; Thin film photovoltaic materials and solar cells
DS 32.2: Poster
Donnerstag, 14. März 2013, 17:00–20:00, Poster B2
Barrier Properties of Nanolaminates Produced by ALD — •Barbara Wegler1,2, Oliver Schmidt2, and Bernhard Hensel1 — 1MSBT, Friedrich-Alexander Universität Erlangen-Nürnberg, Germany — 2Siemens AG, Corporate Technology, Erlangen, Germany
The water vapor transmission rate (WVTR) of the barrier layer is crucial for the lifetime of organic devices such as organic photo detectors (OPD) or organic light emission diodes (OLED). Up to now, the standard method is to glue a glass lid to the device. An alternative is to deposit nanolaminates by using atomic layer deposition (ALD) on the device. Promising results have been reported based on Al2O3/ZrO2 with a WVTR of 3.2 × 10−4 g/(m2 day).
Sputtered ZnSnOx is known to have low WVTRs. Depositing the barrier layers based on ALD nanolaminates instead of sputtering is expected to produce layers with even less defects.
The WVTR of ZnO/SnO and Al2O3/SnO nanolaminates has been obtained through the degradation of calcium to calcium oxide. The transparency of the resulting layers is measured by UV-Vis spectroscopy, as the transparency is an important factor for the efficiency of OPDs or OLEDs.