Regensburg 2013 – scientific programme
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DS: Fachverband Dünne Schichten
DS 32: Poster Session IV: Atomic layer deposition; Organic thin films; Organic Electronics and Phototovoltaics; Organic Materials for Spintronics - from spinterface to devices; Thin film photovoltaic materials and solar cells
DS 32.5: Poster
Thursday, March 14, 2013, 17:00–20:00, Poster B2
Organic molecular ion beam epitaxy of non-volatile molecules — •Gordon Rinke1, Stephan Rauschenbach1, and Klaus Kern1,2 — 1Max-Planck Institute for Solid State Research, Stuttgart, Germany — 2Institut de Physique de la Matiere Condensee, Ecole Polytechnique Federale de Lausanne, Switzerland
Electrospray ion beam deposition (ES-IBD) was developed in our laboratory as a technique for the deposition of non-volatile molecules on well-defined surfaces in ultrahigh vacuum.[1, 2] ES-IBD is based on the creation of intact molecular ions or clusters by electrospray ionization, which are deposited on a surface as a mass selected hyperthermal beam. In contrast to evaporation, where neutral thermal particle beams are used, ES-IBD allows for the full control of the deposition process.
Here we show several examples of crystalline film growth using ES-IBD. Organic thin films are grown in layers or islands from high flux cluster beams.[3] Many other non-volatile molecules, including highly reactive species, form two-dimensional crystals on metal surfaces.
Our results show that, despite the significant differences, ES-IBD can achieve results equivalent to conventional epitaxy. The versatility and enhanced control of the deposition process shows a way towards novel coatings with unique properties.
[1] Small, 2006, 2, 540
[2] ACS Nano, 2009, 3, 2901
[3] Adv. Mater., 2012, 24, 2761-2767