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DS: Fachverband Dünne Schichten

DS 32: Poster Session IV: Atomic layer deposition; Organic thin films; Organic Electronics and Phototovoltaics; Organic Materials for Spintronics - from spinterface to devices; Thin film photovoltaic materials and solar cells

DS 32.8: Poster

Donnerstag, 14. März 2013, 17:00–20:00, Poster B2

A Systematic Growth Study of Thiazolothiazole Derivatives with Varying Deposition Parameters — •Simon Siemering, Daniel Gebauer, and Matthias Wuttig — I. Physikalisches Institut (IA), RWTH Aachen University, D-52056 Aachen, Germany

Thiophene oligomers are an important class of organic semiconductors, which have considerable potential in thin film transistor (TFT) devices. Now we want to investigate their potential as an active layer in organic photovoltaic cells (OPC) and the first step is to understand the influence of different deposition parameters on thin film formation. In the framework of this study thin films of thiazolothiazole derivatives were deposited by organic molecular beam deposition (OMBD) on Indium Tin Oxide (ITO) substrates under high vacuum conditions. The influence of varying deposition rate, substrate temperature and film thickness on structure and morphology is studied with different methods. Atomic force microscopy measurements (AFM) determine the film roughness and correlation length. Film thickness and density are measured by X-ray reflectometry (XRR) while X-ray diffraction (XRD) yields the crystallinity and texture of the sample.