Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 4: Atomic Layer Deposition

DS 4.1: Talk

Monday, March 11, 2013, 12:15–12:30, H8

Realization of platinum 3D nanostructures using an improved atomic layer deposition process — •Yan Mi, Liaoyong Wen, ChengLiang Wang, Huaping Zhao, and Yong Lei — Fachgebiet 3D-Nanostrukturierung, Institut für Physik & IMN MacroNano (ZIK), Technische Universität Ilmenau, Prof. Schmidt Str. 26, 98693 Ilmenau, Germany.

Uniform deposition of metals onto high surface area of porous media is a key challenge for developing efficient catalysts and conducting layers. Self-limiting atomic layer deposition (ALD) provides excellent capabilities for depositing materials on large surface area. In this talk, we explored innovative three-dimensional (3D) surface nano-structuring technique to synthesize highly ordered functional nano-patterns with wide potential applications. The surfaces of as-prepared 3D nanostructures were further functionalized with platinum by ALD. Before the ALD process, the sample surface was modified by O2 plasma process. It is found that plasma-assisted ALD process intensively enhanced the quality of platinum, resulting in well-dispersed platinum nanoparticles and homogeneous continuous platinum nanotubes on highly ordered 3D nano-pattern surface. All these structural advantages make these 3D nanostructures highly desirable for catalysts and conducting layers.