Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 6: Focus Session: Ion Beam Induced Surface Patterns II

DS 6.3: Talk

Monday, March 11, 2013, 15:15–15:30, H8

The role of phase separation for self-organized surface pattern formation by ion beam erosion and metal atom co-deposition — •Kun Zhang, André Pape, Omar Bobes, Marc Brötzmann, and Hans Hofsäss — II. Physikalisches Institut, Universität Göttingen, Germany

We investigate ripple pattern formation on Si during normal incidence ion beam erosion under simultaneous co-deposition of metallic surfactant atoms. In previous work on ion erosion of Si during co-deposition of Fe we proposed that chemical interactions between Fe and Si of the steady-state mixed Fe_xSi surface layer is a dominant contribution to self-organized pattern formation [1,2]. To generalize phase separation effects on the pattern formation we irradiated Si with normal incidence 5 keV Xe ions under simultaneous co-deposition of metal atoms. The metals in the two groups (Fe, Ni, Cu) and (W, Pt, Au) are similar regarding their collision cascade behaviour, but differ strongly regarding their tendency to silicide formation. We find pronounced pattern formation only for those metals which are prone to formation of mono- and disilicides. In contrast, for Cu and Au surfactants the surface remains very flat. Phase separation is seen as the relevant process for the pattern formation on Si during metal co-deposition.
K. Zhang, M. Brötzmann, H. Hofsäss, New. J. Phys. 13, 013033 (2011).
H. Hofsäss, M. Brötzmann, K. Zhang, AIP Advances 2, 032123 (2012).