Regensburg 2013 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 13: Preparation and characterization

HL 13.3: Talk

Monday, March 11, 2013, 13:15–13:30, H15

Controlled Electrodeposition of ZnO — •Miriam Schwarz, Karolis Parfeniukas, Torsten Balster, and Veit Wagner — Jacobs University Bremen, Campusring 1, D-28759 Bremen, Germany.

Depending on the application of nano-structured ZnO, the dimensional demands, for instance crystal spacing, vary. In general, electrodeposition is an attractive method to deposit versatile nanostructures, since it bears significant influence on crystal shape and density. We present different ways to tailor electrodeposited ZnO in the context of requirements for light management and as n-type semiconductor for application in hybrid-organic solar cells. In general a strong dependence of the electrode material is observed. While dense structures growing perpendicular to the surface are obtained on sputtered gold, structures on sputtered ITO electrodes grow tilted and in wider spacing in the range of 1 um. With pulsed voltage deposition at different voltages (-0.775 V, -0.875 V, -0.975 V), the density of the structures on ITO can be adjusted from the micrometer range to below 200 nm with increasing applied potential. The impact on light scattering properties of the resulting ZnO nanostructures is shown. For highly ordered ZnO nano arrays, electrodeposition through an electron-beam structured template is performed enabling to control equidistant spacing of the ZnO crystals from 50 to 100 nm. Learning how to reliably control the growth of electrodeposited ZnO enables the design of a suitable ZnO structures for promising application.