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HL: Fachverband Halbleiterphysik
HL 62: Graphene: SiC substrates and intercalation (O, jointly with HL, TT)
HL 62.9: Talk
Wednesday, March 13, 2013, 18:00–18:15, H17
Transfer-free electrical insulation of epitaxial graphene from its metal substrate — Silvano Lizzit1, Rosanna Larciprete2, Paolo Lacovig1, Matteo Dalmiglio1, Fabrizio Orlando3,4, Alessandro Baraldi3,4, Lauge Gammelgaard5, •Lucas Barreto6, Marco Bianchi6, Edward Perkins6, and Philip Hofmann6 — 1Sincrotrone Trieste, Italy — 2CNR-Institute for Complex Systems, Roma, Italy — 3Physics Department and CENMAT, University of Trieste,Italy — 4IOM-CNR Laboratorio TASC, Trieste, Italy — 5Capres A/S, Lyngby, Denmark — 6Institut for Fysik og Astronomi, Interdisciplinary Nanoscience Center (iNANO), Aarhus Universitet Denmark
High-quality, large-area epitaxial graphene can be grown on metal surfaces, but its transport properties cannot be exploited because the electrical conduction is dominated by the substrate. Here we show how to insulate epitaxial graphene from the Ru(0001) surface it is grown on by a step-wise intercalation of silicon and oxygen, and the eventual formation of a SiO2 layer between the graphene and the metal. The reaction steps are followed by x-ray photoemission spectroscopy. The presence of a SiO2 layer should insulate the metal from the substrate. In order to verify this, lateral transport measurements were performed using a nano-scale multipoint probe technique. The resistance obtained is substantially higher than expected for a clean ruthenium surface but consistent with that expected for graphene. Moreover, the data suggest two-dimensional electronic transport, as expected for graphene.