Regensburg 2013 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 70: Poster Session: Devices; Preparation and characterization; C/diamond; Si/Ge

HL 70.22: Poster

Wednesday, March 13, 2013, 16:00–20:00, Poster A

Analysis of the fabrication process of x-ray waveguides — •Sarah Hoffmann, Henrike Neubauer, Mike Kanbach, and Tim Salditt — Institut für Röntgenphysik, Universität Göttingen

Small sized x-ray sources as provided by x-ray waveguide channels are required for a multitude of applications such as high resolution spectroscopy, diffraction, microscopy and holography [1,2]. We report on a processing scheme which among other techniques involves e-beam lithography, reactive ion etching and Silicon wafer bonding [3], allowing for the fabrication of sub-100 nm sized waveguide channels [4]. Both waveguide geometry and material can be adapted to meet the requirements of a specific experiment, such as the x-ray energy (7.9-17.5 keV) or the desired source size, or the application of a reference beam in a holography setup. As the tunability of the optical properties provided by the waveguide, as the coherence of the beam, its divergence or the waveguide transmission, depends sensitively on the precise control over the several processing steps, an iterative process of diagnostics and optimization is essential. Thereby, the surface roughness of the channel walls could be identified as a key parameter in fabrication of high transmission x-ray waveguides. To study this attribute in detail, complementary methods like AFM, SEM and ellipsometry are employed in addition to x-ray analysis both at synchrotron and lab sources.

[1] A. Jarre et al., Phys. Rev. Lett. 94, 074801 (2005)

[2] C. Krywka et al., J. Appl. Cryst. 45, 85*92 (2012)

[3] A. Kohlstedt et al., Appl. Phys. A 91, 6*12 (2008)

[4] H. Neubauer et al., in preparation