Regensburg 2013 – scientific programme
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HL: Fachverband Halbleiterphysik
HL 90: Poster Session: Quantum information systems; Optical properties; Ultrafast phenomena
HL 90.10: Poster
Thursday, March 14, 2013, 16:00–20:00, Poster A
Feedback loop for in-situ reflection measurement analysis and optimization during material processing of fs-laser structured silicon — •Anna Lena Baumann1, Wolfgang Schippers1, Thomas Gimpel1, Stefan Kontermann1, and Wolfgang Schade1,2 — 1Fraunhofer Heinrich Hertz Institute, EnergieCampus, Am Stollen 19B, 38640 Goslar, Germany — 2Clausthal University of Technology, EFZN, EnergieCampus, Am Stollen 19B, 38640 Goslar
Through femtosecond-laser pulse processing the absorption of silicon can be increased considerably and through incorporation of sulfur also extended in the infrared wavelength range. The increase in absorption in the visible wavelength range is due to a decrease in reflection of the surface structures that arise through the laser process. A setup for spot-by-spot femtosecond-laser scanning and realtime reflection measurement analysis is designed. Using a two axis stage system, a continuous wave laser reflection for feedback and a genetic algorithm for signal analysis, the optimal pulse shape for a tailored sample reflection can be found.