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MA: Fachverband Magnetismus

MA 36: Magnetic Measurement Techniques

MA 36.4: Vortrag

Donnerstag, 14. März 2013, 10:30–10:45, H3

Magneto-optical response of embedded permalloy thin film structures on Si and ZnO substrates investigated by vector-magneto-optical generalized ellipsometry — •Rajkumar Patra¹, Santanu Ghosh¹, Nan Du², Danilo Bürger^2,3, Ilona Skorupa³, Roland Mattheis⁴, Jeff McCord⁵, Oliver G. Schmidt^2,6, and Heidemarie Schmidt² — ¹Indian Institute of Technology Delhi, Department of Physics, 110016 Delhi — ²Faculty of Electrical Engineering and Information Technology, University of Technology Chemnitz, 09107 Chemnitz — ³Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf — ⁴Institute für Photonische Technologien e.V., 07702 Jena — ⁵Institute of Materials Science, University of Kiel — ⁶Institute for Integrative Nanosciences, IFW Dresden, 01609 Dresden

We investigated the magneto-optical coupling in nominal 5, 10, and 20 nm thick permalloy (Ni81Fe19) thin films embedded in a 3 nm thick Ta and a 3 nm thick Ru layer on Si and on ZnO substrates in the spectral range from 300 to 1100 nm by Mueller matrix ellipsometry measurements in a magnetic field of arbitrary orientation and magnitude up to 400 mT at room temperature [1]. The extracted magnetooptical coupling does not depend on the film thickness [2] and can be used to predict the magnetooptical response for differently designed Ru/permalloy/Ta/Si and Ru/permalloy/Ta/ZnO multilayer samples. [1] K. Mok, N. Du, H. Schmidt, Rev. Sci. Instrum. 82 (2011); [2] K. Mok, J. McCord et al., J. of Appl. Phys. 110 (2011) & Phys. Rev. B 84 (2011).