Regensburg 2013 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 5: Topological Insulators 2 (jointly with DS,HL,O,TT)
MA 5.10: Vortrag
Montag, 11. März 2013, 17:45–18:00, H10
Correlation between linear Magnetoresistance and Mobility of Heusler Topological Insulators — •C. Shekhar, A. K. Nayak, S. Ouardi, G. H. Fecher, and C. Felser — Max Planck Institute for Chemical Physics of Solids, Nöthnitzer Str. 40, 01187 Dresden, Germany
Topological insulators (TIs) are a class of quantum materials and belong to a new state of matter with topologically protected gapless Dirac fermionic states. Among the TIs series Heusler compounds are promising candidates for the nanoelectronic devices. If these compounds contain heavy metals (Au, Pb, Pd, Pt, Sb and Bi) and a lanthanide element then they exhibit extraordinary physical properties including zero band gap. Generally, gapless compounds show high mobility, where no threshold energy is required to conduct carriers from occupied states to empty states. Very recently, the exciting discovery of graphene is an example of high-mobility compounds due to its linear dispersion of the bands, where charge carriers behave like massless particles. However, the Heusler TIs having zero band gap are also expected to show high mobility. The Heusler TIs also exhibit nonsaturating and positive magnetoresistance, that shows systematic variations with temperature. The best fitting of observed MR is found with the combination of linear and quadratic field dependence and may be written in form of a quadratic equation: MR=a|B| + (b/2) B2, where B is applied field. It is clear that this MR originates from the contribution of both linear and parabolic terms. The parabolic term is well known and comes from the Lorentz force, while the origin of the linear MR is intriguing.